Product Details
99.95% High purity SiAl sputtering Target
1.Detail:
Content |
Si: 90 wt% ,Al:10 wt% |
Purity |
≥99.95% |
Relative Density |
≥96% |
Resistivity |
≤10mΩ·cm |
Specification |
length(max)4000mm*thickness(max)13mm; linearity:05.mm
|
Processing Mode |
Plasma spraying |
Application |
Low emission glass |
Delivery time |
2 Weeks after receipt of deposit |
2.Why Us :
High purity |
99.9% |
Uniform composition |
element Deviation Index ±2wt% |
Smaller grain |
<100μm |
High density |
2.251g/cm |
Low resitivity |
7 mΩ·cm |
3: Production Workflow Chart
4:Packing :
According to customers' request.
5:Impurity Content:
Fe<=0.03% Cd<=0.0005% Pb<=0.0005% As<=0.0002%
Mn<=0.001% Cu<=0.0005% K<=0.001% Ca<=0.001%
6.Independent intelligent property right
We have obtained 11 independent intelligrnt property rights about sputtering targets and plasma spraying equipments .